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Influence of in situ applied ultrasound during Si[sup +] implantation in SiO[sub 2] on paramagnetic defect generation

✍ Scribed by Jivanescu, M.; Romanyuk, A.; Stesmans, A.

Book ID: 120195721
Publisher: American Institute of Physics
Year: 2010
Tongue: English
Weight: 485 KB
Volume: 107
Category: Article
ISSN: 0021-8979
DOI: 10.1063/1.3369041

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