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Influence of helium dilution of silane on microstructure and opto-electrical properties of hydrogenated nanocrystalline silicon (nc-Si:H) thin films deposited by HW-CVD

โœ Scribed by V.S. Waman; M.M. Kamble; S.S. Ghosh; R.R. Hawaldar; D.P. Amalnerkar; V.G. Sathe; S.W. Gosavi; S.R. Jadkar


Book ID
119322589
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
959 KB
Volume
47
Category
Article
ISSN
0025-5408

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Effects of deposition pressure on the mi
โœ Peiqing Luo; Zhibin Zhou; Youjie Li; Shuquan Lin; Xiaoming Dou; Rongqiang Cui ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 474 KB

We report on the effects of deposition pressure P d on the growth and properties of the B-doped nanocrystalline silicon (nc-Si:H) thin films grown by hot-wire chemical vapor deposition (HWCVD) at very high hydrogen dilution of 98.8%. We found that the crystallinity of nc-Si:H or mc-Si:H films is not