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Influence of film thickness on optical and electrical properties of hydrogenated amorphous silicon

โœ Scribed by F. Demichelis; G. Kaniadakis; E. Mezzetti; P. Mpawenayo; A. Tagliaferro; E. Tresso; P. Rava; G. Della Mea

Publisher
Elsevier Science
Year
1987
Tongue
English
Weight
447 KB
Volume
150
Category
Article
ISSN
0040-6090

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## Abstract Transparent Zinc Oxide (ZnO) thin films have been grown on Si (100) and Sapphire (0001) substrates by RF magnetron sputtering for different growth time intervals (10, 30 and 60 min) to study the substrate and thickness effects. All the films have been grown at a substrate temperature of