The influence of the group V/III molar p
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Durkaya, G. ;Buegler, M. ;Atalay, R. ;Senevirathna, I. ;Alevli, M. ;Hitzemann, O
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Article
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2010
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John Wiley and Sons
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English
⚖ 396 KB
## Abstract The influence of the group V/III molar precursor ratio on the surface morphological and electrical properties of In~0.65~Ga~0.35~N epilayers has been investigated. The layers studied have been grown by high‐pressure chemical vapor deposition, a growth technique that utilizes the reactor