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Influence of crystal orientation in the structure of electrodeposited copper

✍ Scribed by J.Bebczuk De Cusminsky

Publisher
Elsevier Science
Year
1970
Tongue
English
Weight
728 KB
Volume
15
Category
Article
ISSN
0013-4686

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✦ Synopsis

An X-ray diffraction study was made of copper electrodeposited on low index planes of copper single crystals . Three characteristic stages occur during the process : (a) epitaxial growth, (b) twin development, (c) polycrystalline growth .

The deposit thickness, Ah, attained just before polycrystalline growth starts, is hyperbolically related to the cd, high cds giving thinner deposits . For a given cd, Ah is a function of the crystallographic orientation of the base single crystal in the order Ahuul > Ahnool > Ah lllol .

Ah ltt " > Ahltsol > Ahulol

Es wird angenommen Bass diese Reihenfolge in direktem Zusammenhang steht, mit der atomischen Dichte der kristalinen Ebenen and der Stabilitat der verschiedenen kristalinen Ebenen, dumb ihre Arbeitsfunktion gemessen .

Der Mechanismus der Erzeugung der polykristalinen Struktur auf Einkristalle wird besprochen .

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