Inductively-coupled-plasma reactive ion etching of ZnO using BCl3-based plasmas and effect of the plasma treatment on Ti/Au ohmic contacts to ZnO

✍ Scribed by Han-Ki Kim; J.W. Bae; K.-K. Kim; S.-J. Park; Tae-Yeon Seong; I. Adesida

• Book ID: 113936438
• Publisher: Elsevier Science
• Year: 2004
• Tongue: English
• Weight: 297 KB
• Volume: 447-448
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/j.tsf.2003.09.028