Investigation of an Mo/SiO2 interface by
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Jonnard, P.; Bonnelle, C.; Bosseboeuf, A.; Danaie, K.; Beauprez, E.
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Article
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2000
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John Wiley and Sons
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English
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We have studied the solid/solid interface between Mo and SiO 2 films deposited, respectively, by magnetron d.c. sputtering and plasma-enhanced chemical vapour deposition (PECVD). The sample depth profile was characterized by SIMS. We used electron-induced x-ray emission spectroscopy to characterize