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Induced electron emission spectroscopy of reduced lead silicate glass (X-ray photoemission)

โœ Scribed by Clayton W. Bates Jr.; John Helmer; Norbert Wiechert


Publisher
Elsevier Science
Year
1972
Tongue
English
Weight
259 KB
Volume
10
Category
Article
ISSN
0038-1098

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Investigation of an Mo/SiO2 interface by
โœ Jonnard, P.; Bonnelle, C.; Bosseboeuf, A.; Danaie, K.; Beauprez, E. ๐Ÿ“‚ Article ๐Ÿ“… 2000 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 89 KB ๐Ÿ‘ 1 views

We have studied the solid/solid interface between Mo and SiO 2 films deposited, respectively, by magnetron d.c. sputtering and plasma-enhanced chemical vapour deposition (PECVD). The sample depth profile was characterized by SIMS. We used electron-induced x-ray emission spectroscopy to characterize