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In-situ spectroscopic ellipsometry to control the growth of Ti nitride and carbide thin films

✍ Scribed by S. Logothetidis; I. Alexandrou; J. Stoemenos


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
379 KB
Volume
86
Category
Article
ISSN
0169-4332

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## Abstract In‐situ temperature measurement is essential in CVD in order to control the temperature of the growing films. This is frequently achieved by optical pyrometry because it is a sensitive, convenient, and inexpensive technique that can be used in corrosive atmospheres. In this work, in‐sit