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In situ production of epitaxial Ba1−xKxBiO3 thin films by high-oxygen-pressure RF sputtering

✍ Scribed by P. Prieto; U. Poppe; W. Evers; R. Hojczyc; C.L. Jia; K. Urban; K. Schmidt; H. Soltner

No coin nor oath required. For personal study only.

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