In-Situ Monitoring of Chemical Vapor Deposition at Ambient Pressure by Surface-Enhanced Raman Spectroscopy: Initial Growth of Tantalum(V) Oxide on Platinum

✍ Scribed by Chan, Ho Yeung H.; Takoudis, Christos G.; Weaver, Michael J.

• Book ID: 126136841
• Publisher: American Chemical Society
• Year: 1999
• Tongue: English
• Weight: 23 KB
• Volume: 121
• Category: Article
• ISSN: 0002-7863
• DOI: 10.1021/ja991707s