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Back Cover: Monitoring of the growth of microcrystalline silicon by plasma-enhanced chemical vapor deposition using in-situ Raman spectroscopy (Phys. Status Solidi RRL 4/2011)

✍ Scribed by S. Muthmann; F. Köhler; M. Meier; M. Hülsbeck; R. Carius; A. Gordijn


Book ID
112183346
Publisher
John Wiley and Sons
Year
2011
Tongue
English
Weight
487 KB
Volume
5
Category
Article
ISSN
1862-6254

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