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In-situ monitoring and control of hydrogenated amorphous silicon–germanium band-gap profiling during plasma deposition process

✍ Scribed by Moon, Se Youn; You, D.J.; Lee, S.E.; Lee, Heonmin


Book ID
122769041
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
491 KB
Volume
13
Category
Article
ISSN
1567-1739

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