In situ thickness control during plasma deposition of hydrogenated amorphous silicon films by time-resolved microwave conductivity measurements

✍ Scribed by Neitzert, H. C. ;Hirsch, W. ;Kunst, M. ;Nell, M. E. A.

• Book ID: 115343931
• Publisher: The Optical Society
• Year: 1995
• Tongue: English
• Weight: 137 KB
• Volume: 34
• Category: Article
• ISSN: 1559-128X
• DOI: 10.1364/AO.34.000676