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In situ growth of YBaCuO films by ion beam sputtering

✍ Scribed by Jianhua Hao; Xingrong Zhao; Fangqiao Zhou; Xinjian Yi; Zaiguang Li


Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
322 KB
Volume
22
Category
Article
ISSN
0921-5107

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✦ Synopsis


High quality Y-Ba-Cu-O superconducting thin films were fabricated in situ on ZrO 2 substrates by ion beam sputtering assisted by a molecular oxygen source. Films were characterized by X-ray diffraction, resistivity measurements and scanning electron microscopy. As-deposited films were highly oriented and exhibited a zero resistance at 88 K and critical current density Jc (77 K) of 106 A cm-2. A large diameter powder target was advantageous for adjusting the film composition and improving film uniformity. We demonstrate that by using ion beam sputtering, in situ Y-Ba-Cu-O films, which are equal to or better in film quality than those produced with laser ablation and magnetron sputtering, can be deposited.


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