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In situ endpoint detection of reactive ion-beam etching of dielectric gratings with an etch-stop layer using downstream mass spectrometry

โœ Scribed by Xiangfeng Meng; Lifeng Li


Book ID
104002360
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
643 KB
Volume
254
Category
Article
ISSN
0169-4332

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