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In-situ analyses on the reactive sputtering process to deposit Al-doped ZnO films using an Al–Zn alloy target

✍ Scribed by Naoki Tsukamoto; Nobuto Oka; Yuzo Shigesato

Book ID: 113937207
Publisher: Elsevier Science
Year: 2012
Tongue: English
Weight: 812 KB
Volume: 520
Category: Article
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2011.08.031

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