Improving hot-electron hardness of narrow channel MOSFETs by fluorine implantation

✍ Scribed by Yasushiro Nishioka; Toshihiko Itoga; Kiyonori Ohyu; Tso-Ping Ma

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 315 KB
• Volume: 34
• Category: Article
• ISSN: 0038-1101
• DOI: 10.1016/0038-1101(91)90057-6