Improving hot-electron hardness of narrow channel MOSFETs by fluorine implantation : Yasushiro Nishoika, et al. Solid-St. Electron. 34(11), 1197 (1991)

• Publisher: Elsevier Science
• Year: 1992
• Tongue: English
• Weight: 110 KB
• Volume: 32
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(92)90748-a