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Improvement of the adhesion to polyimide substrates of copper films prepared by an ion beam and vapor deposition (IVD) method

โœ Scribed by Akinori Ebe; Eiji Takahashi; Yasushi Iwamoto; Naoto Kuratani; Satoshi Nishiyama; Osamu Imai; Kiyoshi Ogata; Yuichi Setsuhara; Shoji Miyake


Book ID
118367513
Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
499 KB
Volume
281-282
Category
Article
ISSN
0040-6090

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## ลฝ . ลฝ . A combination of ion beam assisted deposition IBAD and plasma enhanced chemical vapor deposition PECVD was used to deposit ลฝ . ลฝ . tetrahedral amorphous carbon layers, known as amorphic diamond a-d , onto 304 stainless steel and tungsten carbide WC substrates. ลฝ . The so-obtained thin