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Improvement in Wear Resistance of High-Strength and High-Toughness Silicon Nitride Modified by Ion Implantation

โœ Scribed by Naoki Nakamura; Kiyoshi Hirao; Yukihiko Yamauchi


Book ID
109255945
Publisher
John Wiley and Sons
Year
2004
Tongue
English
Weight
718 KB
Volume
87
Category
Article
ISSN
0002-7820

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Properties of oxide and nitride layers i
โœ Shigeo Ohira; Masaya Iwaki ๐Ÿ“‚ Article ๐Ÿ“… 1989 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 652 KB

Recent advances in high dose ion implantation The surface properties such as depth profile, techniques have produced silicon-on-insulator chemical bond and structure, and electrical prop-(SOI) substrates for the fabrication of electronic erties of oxide and nitride layers in aluminium devices. Oxyge