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Improvement in dielectric properties of low temperature PECVD silicon dioxide by reaction with hydrazine

โœ Scribed by K. W. Vogt; M. Houston; M. F. Ceiler; C. E. Roberts; P. A. Kohl


Book ID
112817064
Publisher
Springer US
Year
1995
Tongue
English
Weight
485 KB
Volume
24
Category
Article
ISSN
0361-5235

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