Implementation of a TiN cap layer into conventional self-aligned RTP titanium disilicide MOS process

✍ Scribed by W. Kaplan; S-L. Zhang; H. Norström; M. Östling; A. Lindberg

• Publisher: Elsevier Science
• Year: 1992
• Tongue: English
• Weight: 270 KB
• Volume: 19
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(92)90517-u