Implantation and sputtering of Ge ions into SiO2 substrates with the use of Ge ions produced by repetitive laser pulses

✍ Scribed by M. Rosiński; J. Badziak; A. Czarnecka; P. Gasior; P. Parys; M. Pisarek; R. Turan; J. Wołowski; S. Yerci

• Publisher: Elsevier Science
• Year: 2006
• Tongue: English
• Weight: 223 KB
• Volume: 9
• Category: Article
• ISSN: 1369-8001
• DOI: 10.1016/j.mssp.2006.08.051