Impact of reactive ion etching using O2+CHF3 plasma on the endurance performance of FLOTOX EEPROM cells

✍ Scribed by Papadas, C.; Ghibaudo, G.; Pananakakis, G.; Pio, F.; Riva, C.; Ghezzi, P.

• Book ID: 114535206
• Publisher: IEEE
• Year: 1993
• Tongue: English
• Weight: 318 KB
• Volume: 40
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/16.223719