𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Impact of dummies on interconnects network HF propagation performances for the 65 nm node

✍ Scribed by B. Blampey; B. Fléchet; A. Farcy; M. Gallitre; C. Bermond; O. Cueto; J. Torres; G. Angénieux


Book ID
108207672
Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
169 KB
Volume
83
Category
Article
ISSN
0167-9317

No coin nor oath required. For personal study only.


📜 SIMILAR VOLUMES


Impact of porous SiOCH on propagation pe
✍ M. Gallitre; B. Blampey; B. Fléchet; A. Farcy; V. Arnal; C. Bermond; T. Lacrevaz 📂 Article 📅 2007 🏛 Elsevier Science 🌐 English ⚖ 1005 KB

With the dimensions scaling down at each new technology node, introduction of porous dielectric materials is required to reduce the interconnect capacitance. Nevertheless, these materials are very prone to damage during integration, thus increasing their K-value (2.5 as deposited for the 45 nm node)