III-V Semiconductor Materials and Devices

✍ Scribed by R.J. MALIK (Eds.)

• Publisher: North-Holland
• Year: 1989
• Tongue: English
• Leaves: 735
• Series: Materials Processing: Theory and Practices 7
• Category: Library

✦ Synopsis

The main emphasis of this volume is on III-V semiconductor epitaxial and bulk crystal growth techniques. Chapters are also included on material characterization and ion implantation. In order to put these growth techniques into perspective a thorough review of the physics and technology of III-V devices is presented. This is the first book of its kind to discuss the theory of the various crystal growth techniques in relation to their advantages and limitations for use in III-V semiconductor devices

✦ Table of Contents

Content:
Materials Processing – Theory and Practices
Page ii

Front Matter
Page iii

Copyright page
Page iv

Introduction to the Series
Pages v-vi
Franklin F.Y. WANG

Previous Volumes in the Series
Page vii

Preface to Volume 7
Pages vii-ix
Roger J. MALIK

Advisory Board
Page xii

CHAPTER 1 - Melt-Growth of Iii–V Compounds by the Liquid Encapsulation and Horizontal Growth Techniques
Pages 1-72
J.B. MULLIN

CHAPTER 2 - Liquid Phase Epitaxial Growth
Pages 73-110
N. TABATABAIE, V.M. ROBBINS, G.E. STILLMAN

CHAPTER 3 - Vapor Phase Epitaxy of Iii–V Semiconductors
Pages 111-145
R.T. GREEN, C.M. WOLFE

CHAPTER 4 - Metalorganic Chemical Vapor Deposition of Iii–V Semiconductors
Pages 147-216
PD. DAPKUS, J.J. COLEMAN

CHAPTER 5 - Molecular Beam Epitaxy
Pages 217-330
H. SAKAKI

CHAPTER 6 - Ion Implantation in Iii–V Semiconductors
Pages 331-428
J.P. DONNELLY

CHAPTER 7 - Characterization of Iii–V Semiconductors
Pages 429-494
D.C. REYNOLDS, D.C. LOOK

CHAPTER 8 - Iii–V Semiconductor Devices
Pages 495-719
H. BENEKING

Subject Index
Pages 721-727