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[IEEE The 16th International Conference on Microelectronics, 2004. ICM 2004. - Tunis, Tunisia (Dec. 6-8, 2004)] Proceedings. The 16th International Conference on Microelectronics, 2004. ICM 2004. - Grains-growth and clustering effects on boron diffusion in polysilicon during thermal post-implantation annealing.

✍ Scribed by Abadli, S.; Mansour, F.

Book ID: 121722236
Publisher: IEEE
Year: 2004
Weight: 908 KB
Category: Article
ISBN-13: 9780780386563
DOI: 10.1109/icm.2004.1434702

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