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[IEEE International Technical Digest on Electron Devices Meeting - Washington, DC, USA (3-6 Dec. 1989)] International Technical Digest on Electron Devices Meeting - An integrated 0.5 mu m CMOS disposable TiN LDD/salicide spacer technology

โœ Scribed by Pfiester, J.R.; Parrillo, L.C.; Woo, M.; Kawasaki, H.; Boeck, B.; Travis, E.; Gunderson, C.


Book ID
126698490
Publisher
IEEE
Year
1989
Weight
215 KB
Category
Article

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