𝔖 Bobbio Scriptorium

✦ LIBER ✦

[IEEE International Electron Devices Meeting. Technical Digest - San Francisco, CA, USA (8-11 Dec. 1996)] International Electron Devices Meeting. Technical Digest - Gate oxide scaling limits and projection

✍ Scribed by Chenming Hu,

Book ID: 127241364
Publisher: IEEE
Year: 1996
Weight: 337 KB
Category: Article
ISBN-13: 9780780333932
DOI: 10.1109/iedm.1996.553593

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