[IEEE IEEE International Electron Device
✦ LIBER ✦
[IEEE IEEE International Electron Devices Meeting 2003 - Washington, DC, USA (8-10 Dec. 2003)] IEEE International Electron Devices Meeting 2003 - A germanium NMOSFET process integrating metal gate and improved hi-κ dielectrics
✍ Scribed by Chi On Chui, ; Hyoungsub Kim, ; McIntyre, P.C.; Saraswat, K.C.
- Book ID
- 126764668
- Publisher
- IEEE
- Year
- 2003
- Weight
- 302 KB
- Edition
- 1
- Category
- Article
- ISBN-13
- 9780780378728
No coin nor oath required. For personal study only.
📜 SIMILAR VOLUMES
[IEEE IEEE International Electron Device
✍
Baude, P.F.; Ender, D.A.; Kelley, T.W.; Haase, M.A.; Muyres, D.V.; Theiss, S.D.
📂
Article
📅
2003
🏛
IEEE
⚖ 305 KB
[IEEE IEEE International Electron Device
✍
Harrison, S.; Coronel, P.; Leverd, F.; Cerutti, R.; Palla, R.; Delille, D.; Bore
📂
Article
📅
2003
🏛
IEEE
⚖ 302 KB
[IEEE IEEE International Electron Device
✍
Ren, Z.; Fischetti, M.V.; Gusev, E.P.; Cartier, E.A.; Chudzik, M.
📂
Article
📅
2003
🏛
IEEE
⚖ 283 KB
[IEEE IEEE International Electron Device
✍
Pirovano, A.; Lacaita, A.L.; Benvenuti, A.; Pellizzer, F.; Hudgens, S.; Bez, R.
📂
Article
📅
2003
🏛
IEEE
⚖ 289 KB
[IEEE IEEE International Electron Device
✍
Dekker, R.; Dessein, K.; Fock, J.-H.; Gakis, A.; Jonville, C.; Kuijken, O.M.; Mi
📂
Article
📅
2003
🏛
IEEE
⚖ 330 KB