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[IEEE IEEE International Electron Devices Meeting 2003 - Washington, DC, USA (8-10 Dec. 2003)] IEEE International Electron Devices Meeting 2003 - A germanium NMOSFET process integrating metal gate and improved hi-κ dielectrics

✍ Scribed by Chi On Chui, ; Hyoungsub Kim, ; McIntyre, P.C.; Saraswat, K.C.


Book ID
126764668
Publisher
IEEE
Year
2003
Weight
302 KB
Edition
1
Category
Article
ISBN-13
9780780378728

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