𝔖 Bobbio Scriptorium

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[IEEE IEEE International Conference on Simulation of Semiconductor Processes and Devices - Boston, MA, USA (2003.09.3-2003.09.5)] International Conference on Simulation of Semiconductor Processes and Devices, 2003. SISPAD 2003. - Scaling laws for the resistivity increase of sub-100 nm interconnects

✍ Scribed by Steinhoegl, W.; Schindler, G.; Steinlesberger, G.; Traving, M.; Engelhardt, M.

Book ID: 120610770
Publisher: IEEE
Year: 2003
Tongue: English
Weight: 317 KB
Category: Article
ISBN-13: 9780780378261
DOI: 10.1109/SISPAD.2003.1233629

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📜 SIMILAR VOLUMES

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