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[IEEE Conference on Electron Devices, 2005 Spanish - Tarragona, Spain (2-4 Feb. 2005)] Conference on Electron Devices, 2005 Spanish - Interface quality of high-pressure reactive sputtered and atomic layer deposited titanium oxide thin films on silicon

✍ Scribed by Duenas, S.; Castan, H.; Garcia, H.; Barbolla, J.; Andres, E.S.; Martil, I.; Gonzalez-Diaz, G.; Kukli, K.; Aarik, J.

Book ID: 126685895
Publisher: IEEE
Year: 2005
Weight: 629 KB
Category: Article
ISBN-13: 9780780388109
DOI: 10.1109/SCED.2005.1504303

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