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[IEEE Conference on Electron Devices, 2005 Spanish - Tarragona, Spain (2-4 Feb. 2005)] Conference on Electron Devices, 2005 Spanish - Electrical characterization of atomic-layer-deposited hafnium silicate for alternative gate dielectric application

✍ Scribed by Duenas, S.; Castan, H.; Garcia, H.; Barbolla, J.; Kukli, K.; Ritala, M.; Leskela, M.

No coin nor oath required. For personal study only.

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