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[IEEE 2013 24th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2013) - Saratoga Springs, NY (2013.5.14-2013.5.16)] ASMC 2013 SEMI Advanced Semiconductor Manufacturing Conference - On the generation and elimination of lonely poly-silicon crater-defects and their impacts on gate oxide integrity (GOI) in dual-gate technology

✍ Scribed by Lieyi Sheng, ; Porath, Paul; Glines, Eddie

No coin nor oath required. For personal study only.

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