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[IEEE 2012 IEEE Silicon Nanoelectronics Workshop (SNW) - Honolulu, HI, USA (2012.06.10-2012.06.11)] 2012 IEEE Silicon Nanoelectronics Workshop (SNW) - Simultaneous carrier transport enhancement and variability reduction in Si MOSFETs by insertion of partial monolayers of oxygen

✍ Scribed by Mears, R.J.; Xu, N.; Damrongplasit, N.; Takeuchi, H.; Stephenson, R.J.; Cody, N.W.; Yiptong, A.; Huang, X.; Hytha, M.; King-Liu, T.-J.

Book ID: 118128774
Publisher: IEEE
Year: 2012
Weight: 389 KB
Category: Article
ISBN: 1467309958
DOI: 10.1109/snw.2012.6243326

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