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[IEEE 2011 12th International Conference and Seminar of Young Specialists on Micro/Nanotechnologies and Electron Devices (EDM 2011) - Erlagol, Altai, Russia (2011.06.30-2011.07.4)] 2011 International Conference and Seminar on Micro/Nanotechnologies and Electron Devices Proceedings - The formation of multilayer resist mask for transistor T-gates fabrication using electron-beam lithography

✍ Scribed by Anishchenko, Ekaterina V.; Erofeev, Evgeny V.; Ishutkin, Sergey V.; Kagadei, Valery A.; Nosaeva, Ksenia S.

Book ID: 121278789
Publisher: IEEE
Year: 2011
Weight: 276 KB
Category: Article
ISBN: 1612847935
DOI: 10.1109/EDM.2011.6006918

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