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[IEEE 2010 International Conference on Measuring Technology and Mechatronics Automation (ICMTMA 2010) - Changsha City, China (2010.03.13-2010.03.14)] 2010 International Conference on Measuring Technology and Mechatronics Automation - Deposition of Dense SiO2 Thin Films for Electrical Insulation Applications by Microwave ECR Plasma Source Enhanced RF Reactive Magnetron Sputtering

✍ Scribed by Zeng, Qiyong; Zheng, Xiaofeng; Yu, Zhonghua; Cui, Yunxian

Book ID: 121217500
Publisher: IEEE
Year: 2010
Weight: 284 KB
Category: Article
ISBN: 1424450012
DOI: 10.1109/ICMTMA.2010.773

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