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[IEEE 2010 10th IEEE International Conference on Solid-State and Integrated Circuit Technology (ICSICT) - Shanghai, China (2010.11.1-2010.11.4)] 2010 10th IEEE International Conference on Solid-State and Integrated Circuit Technology - GeSi/Si nanostructure formation by Ge ion implantation in (100) silicon wafer

✍ Scribed by Xu, Wenting; Tu, Hailing; Chang, Qing; Xiao, Qinghua

Book ID: 111678098
Publisher: IEEE
Year: 2010
Weight: 817 KB
Volume: 0
Category: Article
ISBN: 1424457971
DOI: 10.1109/icsict.2010.5667470

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