✦ LIBER ✦

[IEEE 2009 International Semiconductor Conference (CAS 2009) - Sinaia, Romania (2009.10.12-2009.10.14)] 2009 International Semiconductor Conference - Reactive ion etching for patterning high aspect ratio and nanoscale features

✍ Scribed by Avram, M.; Avram, A.; Comanescu, F.; Popescu, A.M.; Voitincu, C.

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

[IEEE 2009 International Semiconductor C

✍ Nistor, I.; Wikstrom, T.; Scheinert, M. 📂 Article 📅 2009 🏛 IEEE ⚖ 345 KB

[IEEE 2009 International Semiconductor C

✍ Stanescu, Cornel; Iacob, Radu; Dinca, Cristian; Caracas, Cristi; Profirescu, Ovi 📂 Article 📅 2009 🏛 IEEE ⚖ 601 KB

[IEEE 2009 International Semiconductor C

✍ Damaceanu, Mariana-Dana; Rusu, Radu-Dan; Bruma, Maria; Muller, Alexandru 📂 Article 📅 2009 🏛 IEEE ⚖ 763 KB

[IEEE 2009 International Semiconductor C

✍ Popa, Cosmin 📂 Article 📅 2009 🏛 IEEE ⚖ 536 KB

[IEEE 2009 International Semiconductor C

✍ De Pasquale, Giorgio; Mian Wei, ; Soma, Aurelio; Jing Wang, 📂 Article 📅 2009 🏛 IEEE ⚖ 836 KB

[IEEE 2009 International Semiconductor C

✍ Lazanu, S.; Lazanu, I.; Lepadatu, A.; Stavarache, I. 📂 Article 📅 2009 🏛 IEEE ⚖ 566 KB