✦ LIBER ✦

[IEEE 2009 IEEE International Electron Devices Meeting (IEDM) - Baltimore, MD, USA (2009.12.7-2009.12.9)] 2009 IEEE International Electron Devices Meeting (IEDM) - Effect of bottom electrode of ReRAM with Ta2O5/TiO2 stack on RTN and retention

✍ Scribed by Terai, M.; Sakotsubo, Y.; Saito, Y.; Kotsuji, S.; Hada, H.

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

[IEEE 2009 IEEE International Electron D

✍ Chen, John Y. 📂 Article 📅 2009 🏛 IEEE 🌐 English ⚖ 1012 KB

[IEEE 2009 IEEE International Electron D

✍ Lin, Yu-Ming; Jenkins, Keith; Farmer, Damon; Valdes-Garcia, Alberto; Avouris, Ph 📂 Article 📅 2009 🏛 IEEE 🌐 English ⚖ 304 KB

[IEEE 2009 IEEE International Electron D

✍ Awano, Yuji 📂 Article 📅 2009 🏛 IEEE 🌐 English ⚖ 711 KB

[IEEE 2009 IEEE International Electron D

✍ Scholten, A.J.; Smit, G.D.J.; Pijper, R.M.T.; Tiemeijer, L.F.; Tuinhout, H.P.; v 📂 Article 📅 2009 🏛 IEEE ⚖ 181 KB

[IEEE 2009 IEEE International Electron D

✍ Iannaccone, G.; Fiori, G.; Macucci, M.; Michetti, P.; Cheli, M.; Betti, A.; Marc 📂 Article 📅 2009 🏛 IEEE 🌐 English ⚖ 594 KB

[IEEE 2009 IEEE International Electron D

✍ Ouyang, Yijian; Dai, Hongjie; Guo, Jing 📂 Article 📅 2009 🏛 IEEE 🌐 English ⚖ 530 KB