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[IEEE 2009 10th International Conference on Ultimate Integration on Silicon (ULIS - Aachen, Germany (2009.03.18-2009.03.20)] 2009 10th International Conference on Ultimate Integration of Silicon - A comparative study of non-melt laser spike annealing and flash lamp annealing in terms of transistor performance and pattern effects on SOI-CMOSFETs for the 32 nm node and below

✍ Scribed by Illgen, R.; Flachowsky, S.; Herrmann, T.; Feudel, T.; Thron, D.; Bayha, B.; Klix, W.; Horstmann, M.; Stenzel, R.

Book ID: 124159513
Publisher: IEEE
Year: 2009
Tongue: English
Weight: 583 KB
Category: Article
ISBN: 1424437040
DOI: 10.1109/ULIS.2009.4897561

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