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[IEEE 2008 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Cambridge, MA, USA (2008.05.5-2008.05.7)] 2008 IEEE/SEMI Advanced Semiconductor Manufacturing Conference - Unsaturated Fluorocarbons in the Etching Process, Environmental Benefit, Technical Hurdles

✍ Scribed by Tran-Quinn, Thuy; Lakritz, Mark

Book ID: 126630211
Publisher: IEEE
Year: 2008
Weight: 344 KB
Category: Article
ISBN: 1424419646
DOI: 10.1109/ASMC.2008.4529003

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