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[IEEE 2008 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Cambridge, MA, USA (2008.05.5-2008.05.7)] 2008 IEEE/SEMI Advanced Semiconductor Manufacturing Conference - Matrix Factorisation Techniques for Endpoint Detection in Plasma Etching

✍ Scribed by Ragnoli, E.; McLoone, S.; Ringwood, J.; Macgerailt, N.

Book ID: 120228437
Publisher: IEEE
Year: 2008
Weight: 266 KB
Category: Article
ISBN: 1424419646
DOI: 10.1109/ASMC.2008.4529021

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