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[IEEE 2008 IEEE International Electron Devices Meeting (IEDM) - San Francisco, CA, USA (2008.12.15-2008.12.17)] 2008 IEEE International Electron Devices Meeting - Session 2: Process technology — high-k metal-gate integration

✍ Scribed by Colombo, Luigi; Yoshi Tsuchiya,

Book ID: 126642370
Publisher: IEEE
Year: 2008
Weight: 96 KB
Category: Article
ISBN: 1424423775
DOI: 10.1109/IEDM.2008.4796603

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