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[IEEE 2008 IEEE International Electron Devices Meeting (IEDM) - San Francisco, CA, USA (2008.12.15-2008.12.17)] 2008 IEEE International Electron Devices Meeting - Chemical mechanical polish: The enabling technology

✍ Scribed by Steigerwald, Joseph M.

Book ID: 124160997
Publisher: IEEE
Year: 2008
Weight: 979 KB
Category: Article
ISBN: 1424423775
DOI: 10.1109/IEDM.2008.4796607

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