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[IEEE 2004 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop - Boston, MA, USA (4-6 May 2004)] 2004 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (IEEE Cat. No.04CH37530) - An improved process, metrology and methodology for shallow trench isolation etch

✍ Scribed by Baum, C.; Gaddam, S.

Book ID: 120616843
Publisher: IEEE
Year: 2004
Weight: 294 KB
Category: Article
ISBN-13: 9780780383128
DOI: 10.1109/ASMC.2004.1309543

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