𝔖 Bobbio Scriptorium

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[IEEE IEEE/SEMI. 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop - Boston, MA, USA (23-25 Sept. 1998)] IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168) - A manufacturable shallow trench isolation process for 0.18 μm and beyond-optimization, stress reduction and electrical performance

✍ Scribed by Nouri, F.; Laparra, O.; Sur, H.; Tai, G.C.; Pramanik, D.; Manley, M.

Book ID: 126593975
Publisher: IEEE
Year: 1998
Weight: 586 KB
Category: Article
ISBN-13: 9780780343801
DOI: 10.1109/ASMC.1998.731638

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