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[IEEE 2003 IEEE International Symposium on Semiconductor Manufacturing. - San Jose, CA, USA (30 Sept.-2 Oct. 2003)] 2003 5th International Conference on ASIC. Proceedings (IEEE Cat. No.03TH8690) - Contact lithography defect reduction and monitoring for the 90 nm node

✍ Scribed by Moreau, O.; Bos-Lorenzo, S.; Weisbuch, F.; Mortini, B.; Monget, C.

Book ID: 111966742
Publisher: IEEE
Year: 2003
Weight: 298 KB
Volume: 0
Category: Article
ISBN-13: 9780780378940
DOI: 10.1109/issm.2003.1243247

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