𝔖 Bobbio Scriptorium

✦ LIBER ✦

[IEEE 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. - San Jose, CA, USA (8-10 Oct. 2001)] 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203) - A novel pad conditioning disk design of tungsten chemical mechanical polishing process for deep sub-micron device yield improvement

✍ Scribed by Wang, T.C.; Hsieh, T.E.; Wang, Y.L.; Liu, C.W.; Lo, K.Y.; Wang, J.K.; Lee, W.

Book ID: 126694406
Publisher: IEEE
Year: 2001
Weight: 381 KB
Category: Article
ISBN-13: 9780780367319
DOI: 10.1109/ISSM.2001.962991

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

[IEEE 2001 IEEE International Symposium

[IEEE 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. - San Jose, CA, USA (8-10 Oct. 2001)] 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203) - Improvement of 300mm FOUP mini-environment

✍ Seita, H.; Fujii, A.; Suzuki, T.; Kimoto, S.; Shippou, O.; Fujiwara, K.; Tokunag 📂 Article 📅 2001 🏛 IEEE ⚖ 334 KB

[IEEE 2001 IEEE International Symposium

[IEEE 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. - San Jose, CA, USA (8-10 Oct. 2001)] 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203) - Optimum drying method for scan coating

✍ Kobayashi, S.; Kitano, T.; Takeshita, K.; Sugimoto, S.; Akimoto, M. 📂 Article 📅 2001 🏛 IEEE ⚖ 339 KB

[IEEE 2001 IEEE International Symposium

[IEEE 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. - San Jose, CA, USA (8-10 Oct. 2001)] 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203) - Talking shop - linking training to factory indicators

✍ Wilson, S. 📂 Article 📅 2001 🏛 IEEE ⚖ 634 KB

[IEEE 2001 IEEE International Symposium

[IEEE 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. - San Jose, CA, USA (8-10 Oct. 2001)] 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203) - Full profile inter-layer dielectric CMP analysis

✍ Runzi Chang, ; Spanos, C.J. 📂 Article 📅 2001 🏛 IEEE ⚖ 382 KB

[IEEE 2001 IEEE International Symposium

[IEEE 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. - San Jose, CA, USA (8-10 Oct. 2001)] 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203) - Pre-metal clean optimization for cluster defect prevention

✍ Ku, S.Y.; Lo, T.W.; Shih, Y.J.; Shi, C.J.; Wang, C.H.; Yu, Y.J. 📂 Article 📅 2001 🏛 IEEE ⚖ 292 KB

[IEEE 2001 IEEE International Symposium

[IEEE 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. - San Jose, CA, USA (8-10 Oct. 2001)] 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203) - Comparative analysis of 300 mm FAB architectures impact of equipment sets on wafer cost and dynamic performance

✍ Bachrach, R.; Pool, M.; Genovese, K.; Moran, J.C.; O'Halloran, M.D.; Connolly, T 📂 Article 📅 2001 🏛 IEEE ⚖ 753 KB