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[IEEE 2000 Symposium on VLSI Technology. Digest of Technical Papers - Honolulu, HI, USA (13-15 June 2000)] 2000 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.00CH37104) - Gate oxide breakdown under Current Limited Constant Voltage Stress

✍ Scribed by Linder, B.P.; Stathis, J.H.; Wachnik, R.A.; Wu, E.; Cohen, S.A.; Ray, A.; Vayshenker, A.

Book ID: 123614960
Publisher: IEEE
Year: 2000
Weight: 234 KB
Edition: 1
Category: Article
ISBN-13: 9780780363052
DOI: 10.1109/VLSIT.2000.852830

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